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Ultra-high Resolution Scanning Electron Microscope SU8200 Series

State: Out of stock
Innovative Cold Field Emission Gun with Unmatched Resolution and Beam Stability

This novel CFE gun employs a Hitachi patented "Mild flashing" technique and a new vacuum system which greatly minimizes gas molecule deposition on the emitter tip. The emitter always operates in a "clean" state, and emission current and beam stability are significantly improved. The result is the ultimate SEM electron source offering high S/N, stability, and uncompromising resolution performance at low acceleration voltages. Further, these enhanced performance capabilities open a new gateway for low voltage elemental microanalysis.

SU8200 system features include a new top detector filtering system for enhanced electron detection specificity. Fine contrast differentiation is now achieved by selectively filtering inelastic scattering electrons and directly detecting specific energy back scattered electrons. This selective filtering is particularly powerful for enhancing material contrast at low acceleration voltages. Vibration control measures for the stage and chamber, and optimization of the optical system contribute to the high resolution system performance of 0.8 nm at 15 kV and 1.1 nm at 1 kV.
Warranty: No warranty infomation


Price: Contact us




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  • Delivery time: 8h00 - 18h00 daily
  • Genuine product, provided width CO, CQ
  • 03 months of free warranty for consumable and accessories
  • 12 months of free warranty for main equipment
  • Accessorie's price is applied only when purchased with
    main equipment
  • Contact us for any particular accessory's quotion
Email: info@redstarvietnam.com Every day in week

● Innovative CFE gun yielding ultra bright, stable probe current for high-resolution, low kV observations and elemental analyses
● High resolution performance (1.1 nm / 1 kV, 0.8 nm / 15 kV)
● Ultra-high vacuum gun and sample chambers to minimize contamination
● Optional Top Filter detection system for fine material contrast differentiation

 

SU8220

SU8230

SU8240

Secondary Electron Image Resolution1

0.8 nm (Vacc 15 kV, WD=4 mm, Magnification 270 kx)
1.1 nm (Landing voltage 1 kV, WD=1.5 mm, Magnification 200 kx)
2

Landing voltage

0.01-30 kV

Magnification

20-1,000,000x3

Stage Control

5-stage actuator

5-stage actuator

5-stage actuator
Regulus®stage
4

Traverse range

X

050mm

0110mm

0110mm

Y

050mm

0110mm

080mm

R

360°

Z

1.530mm

1.540mm

1.540mm

T

-570°

Stage reproduction

-

-

±0.5µm or less

 

 

*1:Smallest particle gap measured in SEM images with Hitachi High-Tech samples

*2:Observation in deceleration mode

*3:Magnification specified based on a display size of 127 mm × 95 mm

*4:Regulus®(REGULated Ultra Stable: Hitachi High-Tech high-performance stage) is a registered trademark of Hitachi High-Technologies

         Corporation in Japan and U.S.

 

 

 

Application Data

 

 

High Resolution Imaging

 

 

High Resolution Imaging

 

Sample :Mesoporous silica nanospheres
Landing Voltage :500 V
Sample courtesy of Tokyo Institute of Technology, Dr.Toshiyuki Yokoi

 

 

High Spatial resolution X-ray Microanalysis

 

 

High Spatial resolution X-ray Microanalysis

 

Sample :Au/Cu2O core-shell nanocubes
EDX mapping condition :5 kV, 0.7 nA, 15 min, 150,000x
Sample courtesy of Institute for Chemical Research, Kyoto University, Dr.Toshiharu Teranishi
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