Simultaneous WDXRF Spectrometer for ≤200 mm Wafers
Film thickness and composition measurements on wafers and media disks
The WDA-3650 X-ray fluorescence spectrometer for thin film evaluation continues Rigaku's 45-year history of XRF wafer analyzers that has mirrored the history of thin film device development. This latest XRF metrology tool contributes significantly to the process control of metal film thickness, film composition, and element concentration with new functions and a low-COO design.